Description
The system provides a configurable design allowing users to choose from multiple magnet options and stage configurations to best match their application requirements. It supports different perpendicular magnetic field strengths, optional in-plane magnetic capability, and several stage types to accommodate wafer sizes ranging from small samples to full 300 mm wafers.
Summary Table
| Category | Options / Key Details |
|---|---|
| Perpendicular Magnets |
• 0.6 T perpendicular magnet • 1 T perpendicular magnet |
| In-Plane Magnet Option | ~0.2 T in-plane magnetic field |
| Stage Options |
• Rotary stage for 300 mm wafers • XY stage for 200 mm wafers (full in-plane wafer coverage) • Manual stage for smaller wafers |
| System Flexibility | Fully configurable based on user application requirements |
